Abstract
Thin films of nickel oxide were deposited with different thicknesses in a mixed atmosphere of O 2 and Ar gases from a high purity target of 99.99% nickel using the reactive DC-sputtering technique. The same amount of the Pt -catalyst was sputtered from a high purity target of 99.99% platinum in Ar atmosphere onto the top of nickel oxide films with different thicknesses. The gasochromic behavior of the films was investigated. The optical response was measured for the as-deposited and for the intercalated films with hydrogen ions. The change of the transmission resulting from the ion insertion in the films was calculated in the visible and the near infrared regions. The fundamental optical energy gap was determined and studied as a function of the film thickness and the time of ion intercalation.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
