Abstract
In this article, the electrical properties of PAN-GO/p-Si Schottky diode were investigated in the dark at room temperature. Field-emission scanning electron microscopy (FE-SEM) was utilized to study the structure of the PAN:GO interfacial layer. Diode parameters were calculated according to thermionic emission theory. By using the I-V characteristic of the prepared PAN-GO diode, the ideality factor (n), barrier height (ФB) and series resistance (Rs) values were evaluated with the I-V method and Norde functions. The barrier height values calculated with the I-V and Norde function were found to be 0.767 eV and 0.761 eV, respectively. The ideality factor was found to be 2.078 from the I-V method. The series resistance value of the diode was calculated as 42 kΩ using Norde functions. Energy-dependence profile of interface state density was determined from the current-voltage characteristics by considering the voltage-dependence of barrier height and ideality factor The interface state density (Nss) values of the PAN-GO/p-Si Schottky diode are 9.5x1011 eV-1cm-2 for 0.35-Ev eV and 1.03x1011 eV-1cm-2 for 0.74-Ev eV. Experimental results approved that the PAN-GO interfacial layer improved the performance of metal-semiconductor Schottky diode in respect of low ideality factor, interface state density, and high barrier height and rectification rate.
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