Abstract
We report on the crystallinity, N incorporation efficiency, optical properties, and electrical properties of N and Te codoped ZnO films grown by plasma-assisted molecular-beam epitaxy. Te improves the surface morphology and roughness of ZnO films in terms of both streak reflection high energy electron diffraction pattern and atomic force microscopy observations. Also, N and Te codoping is helpful to improve the crystallinity and N incorporation efficiency simultaneously. We found that; (a) narrower x-ray linewidth and higher N concentration were obtained by codoping. (b) Nitrogen related emission lines including donor-acceptor pair and acceptor-bound exciton dominantly emerged in photoluminescence spectra. (c) Codoping enhanced the carrier compensation of native donors in ZnO films and suppressed the dislocation scattering. As a consequence, we concluded that N and Te codoping is very effective for the growth of reliable p-type ZnO films which fulfill the controversial requirements; high N concentration and high crystallinity, simultaneously.
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