Investigation of Texture and Residual Stresses in Reactive Magnetron Sputtered TiN coatings on M2 Steel Substrates

Abstract

The development of crystallographic texture and residual macro‐stresses during the growth from 500 nm to 4000 nm of TiN films applied by reactive Closed Field Unbalanced Magnetron Sputtering (CFUBMS) on M2 tool steel at three direct target currents (Id) (namely 4, 6 and 8A) have been analyzed via X‐ray diffraction.