Abstract
In this study, (CuO/ZnO:Al) heterostructure thin films were grown on SnO2 :F-coated glass substrate by using the spin coating method. To investigate the effects of thickness on (CuO/ZnO:Al) heterostructure, ZnO:Al films were deposited in different thicknesses. The structural, optical, surface, and electrical properties of these heterostructure were examined in detail. The structural and optical properties of obtained heterostructure were examined by X-ray diffraction and UV-VIS spectrophotometer, respectively. The surface properties were analyzed by using atomic force microscope and scanning electron microscope. The electrical properties of these heterostructure were determined by current-voltage (I-V) characteristics at room temperature in dark. The electrical parameters (i.e., ideality factor and barrier height) were calculated by termoionic emission theory by using I-V measurement data. The change for thickness of n-type AZO layer in the (CuO/ZnO:Al/SnO2:F) heterostructure caused significant changes in its physical properties.
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