Abstract
The influence of annealing in various atmospheres on properties of the undoped SnO x thin films has been studied. The films with thickness of ∼400 nm have been deposited on glass substrate by a method of magnetron sputtering in argon–oxygen atmosphere at the pressure inside the chamber 0.9 and 2.7 Pa. The dependences of structural and optical properties of SnO x films from temperature of annealing in air, vacuum and atmosphere hydrogen have been investigated. Correlations between the structural and optical properties of tin oxide films were found.
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