Abstract
A high-intensity femtosecond (fs) laser can fabricate complicated three-dimensional microstructures inside photosensitive glass with high spatial resolution. In this work, the mechanism of the photoreaction of the photosensitive glass to the infrared fs laser is investigated. We examine the photoinduced electron excitation process on the basis of the determination of the critical dose and a change of the optical-absorption spectrum after the fs laser irradiation. The photoreaction mechanism is discussed in comparison with the case of an ultraviolet nanosecond laser irradiation. Finally, the successive interband electron excitation through defect levels by multiphoton absorption is proposed.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
