Investigation of photo-induced corrosion of copper in aqueous solution based on point defect model

Abstract

The corrosion behaviors of Cu in a chloride-containing borate buffer solution (pH 8.4) with and without visible light illumination were investigated in the present work. Visible light illumination was shown to induce distinct corrosion behaviors during different stages of exposure. In the early stage, visible light illumination facilitated the growth of a less defective Cu2O film which offered higher resistance to corrosion. Whereas in the longer-term visible light illumination was found to destabilize the Cu2O film and hence accelerated the Cu dissolution. The corrosion mechanisms corresponding to the corrosion behaviors during different stages of exposure were discussed based on the point defect model (PDM).