Abstract
AbstractNitrogen‐vacancy (NV) centers were incorporated during hot filament chemical vapor deposition of diamond nanocrystallites and nanocrystalline diamond (NCD) films. From the latter nanopillars with different diameters were prepared applying electron beam lithography and inductively coupled plasma reactive ion etching. The deposition of either single crystallites or closed films was controlled by the nucleation density on the silicon substrates and the process duration. Optical investigations revealed the presence of ensembles of color centers in both nanostructures. An enhancement of the fluorescence emission by an order of magnitude was observed after the structuring of the NCD films.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
