Investigation of Near-IR Emission from Hydrogenated Nanocrystalline Silicon – The Oxygen Defect Band

Abstract

AbstractHydrogenated nanocrystalline silicon (nc-Si:H), a mixture of nanometer sized crystallites and amorphous silicon tissue, demonstrates a photoluminescence band centered at ∼ 0.7 eV, which emerges in response to annealing at an onset temperature of ∼ 200–300 °C. This temperature range correlates well with hydrogen effusion spectroscopy studies, and evidence suggests thermal liberation of hydrogen from grain boundary regions allows oxidation of crystallite surfaces during annealing. We tentatively attribute the 0.7 eV PL in nc-Si:H to deep donor defect states related to oxygen precipitates, and argue for the possible involvement of dislocations inside of crystallites to accompany these precipitates.