Abstract
Results of the studies of plasma–chemical processes in plasma of microwave discharge in gas mixture of hydrogen, methane, and phosphine are presented. For the first time, the dependence of emission intensity of PH radical on the parameters of plasma maintenance is studied in a wide range of variation of gas pressure, microwave power, and phosphine and methane content in gas mixture. Experiments are conducted under conditions that are used in the chemical vapor deposition (CVD) reactors for doping diamond with phosphorus. The relationship between emission intensity of PH radical and efficiency of the incorporation of phosphorus into diamond is analyzed.
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