Investigation of microstructural and mechanical properties of sputter-deposited Ni3Al films at different substrate temperatures

Abstract

Ni3Al films were deposited on silicon (100) substrate at different substrate temperatures by DC magnetron sputtering. The evolution of phase, microstructure, surface topography and mechanical properties have been investigated as a function of substrate temperature via XRD, FE-SEM, AFM and nanoindentation respectively. Results revealed that the deposited film possessed the preferred orientation of (111) whereas the crystallite size increased and grain size decreased with increase in the substrate temperature. The results of nanoindentation showed that the hardness of the film increased up to 400 °C after which it abruptly decreased. Maximum hardness of ∼13 GPa was achieved when the film was deposited at the substrate temperature of 400 °C. The surface roughness of the film increases simultaneously with the increase in substrate temperature whereas the static contact angle and mechanical properties declined significantly for the film deposited at the substrate temperature of 600 °C. This study reflects the impact of substrate temperature on the evolution of phase, microstructure and mechanical properties of Ni3Al coatings deposited at different substrate temperatures.