Investigation of Mechanical, Chemical and Adsorptive Properties of Novel Silicon-Based Adsorbents with Activated Carbon Structure

Christian Bläker,Dieter Bathen,Christoph Pasel,Stefanie Heib,Burak Atakan

doi:10.3390/c3030027

Abstract

In this article, for the first time the chemical and mechanical properties of novel adsorbents based on the coating of activated carbons with silicon carbide are reported. The adsorbents are prepared by chemical vapor infiltration (CVI) of activated carbons with tetramethylsilane (TMS) as a precursor. A comparison of two different modified types of activated carbon, C40/4 Extra and A35/4 Extra, each infiltrated with 25%-mass at infiltration temperatures of 973.15 and 1098.15 K, respectively, is presented. Adsorption properties were characterized by measuring nitrogen isotherms and volatile organic compounds (VOC) isotherms in gas phase and excess isotherms in liquid phase. In addition, the physico-chemical properties including the bulk density, ash content, particle hardness, abrasion, conductivity, water-soluble components, and pH value were determined. Furthermore, the first experiments in a fluidized bed adsorber are presented. The results show that the adsorption properties of the modified adsorbents are mainly maintained. The particle hardness and the abrasion resistance increases with increasing infiltration temperature, which leads to an overall increasing of mechanical stability. A modification of the chemical stability as a result of the infiltration experiments is not observed.

Highlights

Activated carbon is one of the most important adsorbents due to its high porosity, large specific surface area, and chemical properties [1]
A common method to produce silicon carbide (SiC) functionalized materials, which cover a broad range of applications from high voltage and electronic devices to high temperature diffusion barriers, is chemical vapor deposition (CVD) [13,14,15,16,17,18,19,20,21,22]
Results and Discussion in a fluidized bed adsorber demonstrate the modification of mechanical stability

Summary

Introduction

Activated carbon is one of the most important adsorbents due to its high porosity, large specific surface area, and chemical properties [1]. A common method to produce SiC functionalized materials, which cover a broad range of applications from high voltage and electronic devices to high temperature diffusion barriers, is chemical vapor deposition (CVD) [13,14,15,16,17,18,19,20,21,22]. This process may take place in porous materials,

Methods

Results

Conclusion