Investigation of Improvement of Electronic Properties and Ductility of RuAl2 Semiconducting Material by Boron Doping Using First-Principles Calculations

Abstract

The occupation mechanism and influence of B doping on the electronic and mechanical properties of RuAl2 semiconducting compound have been investigated using first-principles calculations. Four possible B doping sites are considered. The results show that B-doped RuAl2 is thermodynamically stable. In particular, B element prefers to occupy B(4) site in comparison with other sites. Importantly, B doping improves the electronic properties of RuAl2 by shifting the Al 3p and Ru 4d states from the Fermi level (EF) to the valence band. Although B doping weakens the resistance to volume and shear deformation as well as the elastic stiffness of RuAl2, it improves the ductility due to the formation of Ru-B and Al-B bonds. Therefore, it can be concluded that B is a favorable doping element to improve the electronic properties and ductility of RuAl2 semiconducting compound.