Investigation of Electrochromic WO<sub>3</sub> Nanorods Prepared by DС Reactive Magnetron Sputtering with GLAD Technique

Abstract

Tungsten oxide (WO3) nanorods were prepared by a DC reactive magnetron sputtering with a glancing-angle deposition (GLAD) technique, which promoted high surface area, for electrochromic applications. During the deposition, a high-quality tungsten target was sputtered under oxygen ambience on to Si (100) and glass/ITO substrates. The variation of the deposition time, which affected the length, size and patterns of the nanorods, was investigated based on their electrochromic properties. For physical studies, the prepared nanorods were examined by X-ray diffraction and field-emission scanning electron microscopy, which demonstrated moderately ordered nanorods with amorphous phase. The results showed that the length and size of nanorod were increased, in nearly linear order, with increasing the deposition time. For optical characteristics of the prepared films, the UV-Vis spectrophotometry was use to determined their transmission spectra and optical contrasts from the colored and bleached state. The electrochromic properties were also determined from cyclic voltammetry. The results indicated that, because of the optimal relations between the nanostructural length and size, the WO3 nanorods prepared at 75 minutes (approximately 422 nm) yielded the highest optical contrast and electrochromic functions.