Abstract
Electrochemical preparation of multilayers of Cu/Co(Cu) has been investigated using cyclic voltammetry and in situ atomic force microscopy. Potentiostatic pulse deposition of Copper and Cobalt has been shown to reduce the surface roughness of the electrodeposits. Multilayers of Cu/Co(Cu) have been grown electrochemically using pulse deposition technique. Formation of coherent multilayers has been demonstrated using grazing angle X-ray diffraction studies.
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