Abstract
Angular atomic emission distributions of sputtered neutral particles indicate the angular momentum distribution of collision cascades modulated by lattice induced anisotropies of the ejection mechanism. The differential sputtering yield was measured in the angular range between 3° and 80° to the target normal using the collector method: after condensation of the sputtered target material on cooled hemispherical collectors the thickness distributions of the sputtered films were measured in an electron backscattering device. In this way, undistorted angular sputtering yields produced by ion bombardment of monocrystalline Au under various incidence angles were investigated. The results are presented for incidence directions previously checked by ion-induced secondary electron emission. For incidence angles up to 75° to the target normal no deviation from a symmetric emission relative to the surface normal is obvious, whereas the distributions at 80° and 85° show a preference for emission back to the direction of the incident ions.
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