Abstract
We present an all optical image amplifier in the pulsed ultraviolet (355 nm) based on photorefractive two wave mixing and its implementation in an optical micro-lithographic system. Due to the high possible amplification factor it is possible to use masks with low damage threshold such as polymeric slides or an amplitude modulator based on liquid crystals. This leads to a versatile system which is independent of expensively prepared masks. The amplified image is de-magnified to the sub-millimetre range and projected onto the target. The main application for our system is the authentication of artifacts by imprinting an individual code onto the item surface.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
