Inventive design of Cu/SiO2 substrate for chemical vapor deposition preparation of dense carbon nanofibers

Abstract

In this study, dense carbon nanofibers (CNFs) were prepared by CVD method on the surface of Cu/SiO2 substrate. The Cu/SiO2 substrate was fabricated by RF magnetron sputtering method. Firstly, the Cu atoms were sputtered to the surface of the SiO2 substrate as the seed layer and the CNFs are planted on the seed layer by CVD technology. The CNFs with a diameter of 80 nm were prepared by this process. The CNFs prepared by this process get the advantages of small diameter, dense arrangement and high graphitization. These benefits are beneficial to the composite of multilayer materials. The preparation process remains steady, pollution-free and efficient, which breaks through the usual limitations of the preparation of CNFs. Direct preparation of CNFs on silica substrate is conducive to the application of integrated circuits and electronic devices.