Abstract
SiO2/air three-dimensional (3D) periodic structures were fabricated by removing Si layers partially from Si/SiO2 3D photonic crystals (PhCs) formed by using autocloning. CdS/SiO2 3D periodic structures were formed by introducing CdS into the SiO2/air structures by the TEA method and photoluminescence (PL) was observed from the introduced CdS. TiO2/air/CdS two-dimensional (2D) PhCs were also fabricated by introducing CdS into the voids of TiO2/air 2D periodic structures, in which SiO2 layers were partially etched out from TiO2/SiO2 2D PhCs fabricated by using autocloning. PL radiating normal to the surface was measured and large polarization dependence was observed.
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