Abstract
Si/Si1−xGex multiple quantum wells with abrupt heterointerfaces have been formed by segregant-assisted growth (SAG) with Sb. Distinct well-width dependence of intersubband absorption in the narrow quantum wells has been observed. The well-width dependence of the absorption peak energy is in good agreement with a calculation based on the Kronig–Penney model where interfacial smearing is taken to be less than 0.4 nm, suggesting the integrity of Si/Si1−xGex interfaces grown by SAG.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
