Abstract
Internal stresses in sputter-deposited aluminium oxide, titanium carbide and copper films were measured. Aluminium oxide and titanium carbide films developed compressive stresses whereas copper films exhibited tensile stresses. Their magnitudes and signs were found to be in good agreement with those of the thermal stresses estimated from the constants and deposition temperatures of the materials. It is suggested that an atomic peening is one of the verifiable mechanisms whereby the compressive component of the stresses is induced in these films.
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