Abstract
AbstractThe feasibility of producing layered composite sheet material, in which the matrix is the intermetallic compound TiAl, using physical vapor deposition (PVD) has been demonstrated. The PVD techniques of sputtering and electron beam evaporation were both investigated. Films were deposited by alternately sputtering from targets of composition Ti-53A1–3Nb and TiB2 or were co-deposited from separate electron beam heated hearths containing Ti and Al. In the latter case, nitrogen gas was pulsed into the deposition chamber at controlled intervals resulting in the formation of a TiAl/TiAlN layered composite. The composition of the films was determined using Auger analysis and Rutherford backscattering spectroscopy and the crystal structure was checked using X-ray and electron diffraction. Cross-sections through the films were prepared for examination by transmission electron microscopy so that the layered microstructure of the films could be verified.
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