Abstract
Transient refractive-index fields in stagnant CuSO 4 solutions were measured by double beam interferometry during the galvanostatic deposition of copper. Concentration profiles in the electrolyte have been derived from the interferograms by correcting for optical aberrations caused by beam deflection and reflection. The time-dependent concentration profiles are in good agreement with those derived from a solution of the diffusion equation in which the concentration dependence of diffusivity is taken into account.
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