Interferometric Shack–Hartmann wavefront sensor with an array of four-hole apertures

Abstract

A modified Hartmann test based on the interference produced by a four-hole mask can be used to measure an unknown wavefront. To scan the wavefront, the interference pattern is measured for different positions of the mask. The position of the central fringe of the diamond-shaped interference pattern gives a measure of the local wavefront slopes. Using a set of four-hole apertures located behind an array of lenslets in such a way that each four-hole window is inside one lenslet area, a set of four-hole interference patterns can be obtained in the back focal plane of the lenslets without having to scan the wavefront. The central fringe area of each interference pattern is narrower than the area of the central maximum of the diffraction pattern of the lenslet, increasing the accuracy in the estimate of the lobe position as compared with the Shack-Hartmann wavefront sensor.