Abstract
The change in optical path difference caused by rotation of a plate with respect to incident light flux is examined in [4]. The thickness of a transparent dielectric film is dedetermined by estimating the shift in the interference pattern that is due to the change in optical path difference during rotation of the film placed on one of the arms of a two-beam interferometer, perpendicularly to the light flux: h = A/{2ne[(n 2-sin = i) I/2 -cos i -n + i]}, where h is the film thickness, A is the shift in the interference pattern, A = m%/2 (l is the wavelength, m is the number of interference fringes), n and n e are, respectively, the indices of refraction of the film and the environment, and i is the angle of film rotation.
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