Interference in photo‐detachment of triatomic negative ion near a hard reflecting surface

Abstract

AbstractThe physical phenomena in which an extra electron is removed from a negative ion is called photo‐detachment. Photo‐detachment is important phenomena, used to find the structure of anions, particularly to find the electron affinities. In this paper, we present theoretically the induced effects in the photo‐detached of triatomic anion H3− near hard reflecting wall or surface. For the photo‐detachment process, a z‐polarized coherent source of radiations (laser) is used to kick electrons from H3− anion in the domain of a hard reflecting surface. Imaging method is adopted to derive the generalized detached electron wave, differential cross‐section and the total photo detachment cross‐section analytically. Numerical solutions (simulations) for total electron flux and the total cross‐section is presented. The electron flux, shows visible oscillations and hence the induced effect of surface in the interference. It is depicted that the reflecting hard wall strongly affects the flux and total photo‐detachment cross‐section. The analytical results are extended for triiodide I3− anion numerically, which also show interference. The total photo detachment cross‐section for I3− is calculated numerically and compared with cross‐section of H3−.