Abstract
Internal and interfacial observations of diamond particles formed by plasma-assisted CVD have been carried out using an ultra-high-voltage transmission electron microscope from especially cross-sectional view. Diamond particles deposited at lower CH4 concentrations are faceted polyhedra, and line defects composed of micro-twin lamellae are found to emerge from the base center area, indicating that diamond nucleates at a site, then grows to form the polyhedron. Based on these observations, a nucleation control study has been carried out. SiO2-patterned Si substrate is firstly roughened by abrasive powders, then irradiated by an Ar beam at a certain angle. After deposition on this substrate using plasma-assisted CVD, diamond particles have been selectively grown on particular positions on the SiO2 dots.
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