Interfacial structure, bonding and composition of InAs and GaSb thin films determined using coherent Bragg rod analysis

Abstract

We have used Bragg rod x-ray diffraction combined with a direct method of phase retrieval to extract atomic resolution electron-density maps of a complementary series of heteroepitaxial III-V semiconductor samples. From the three-dimensional electron-density maps we derive the monolayer spacings, the chemical compositions, and the characteristics of the bonding for all atomic planes in the film and across the film-substrate interface. InAs films grown on GaSb(001) under two different As conditions (using dimer or tetramer forms) both showed conformal roughness and mixed $\mathrm{Ga}\mathrm{As}∕\mathrm{In}\mathrm{Sb}$ interfacial bonding character. The As tetramer conditions favored InSb bonding at the interface while, in the case of the dimer, the percentages corresponding to GaAs and InSb bonding were equal within the experimental error. The GaSb film grown on InAs(001) displayed significant In and As interdiffusion and had a relatively large fraction of GaAs-like bonds at the interface.