Abstract
Room-temperature oxidation of (111)Si catalyzed by η″-Cu3Si has been studied by transmission electron microscopy, x-ray diffractometry (XRD), and Auger electron spectroscopy. XRD analysis showed that volume fractions of η″-Cu3Si and Cu decrease and increase with exposure time in air ambient, respectively. From TEM diffraction analysis, Cu precipitates were found to be epitaxially related to Si. After prolonged exposure in air, the Cu precipitates were found to form an irregular network structure in the SiO2 layer. Examination of the same area of annealed samples with intermittent exposure in air indicated that the oxidation was mainly initiated at the grain boundaries. Significant differences in room-temperature oxidation behavior between (111) and (001) samples were found.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
