Abstract
Stability and formation kinetics of TiN and silicides in Ti/Si3N4 and TiN/Si diffusion joints have been investigated. Reactions in the diffusion couples were studied experimentally in the temperature range between 950 and 1100 °C. Isothermal sections and activity diagrams of the Ti-Si-N system were calculated using the recent thermodynamic data. Both the thermodynamic calculations and experimental results indicate that TiN and Si react with each other and form TiSi2 and even Si3N4 if the activity of nitrogen is high enough. Similarly, results from the Ti/Si3N4 couple were in good accordance with calculated phase equilibria. The experiments carried out in vacuum ampoules and in a vacuum furnace showed that the gas phase has a strong effect on the reactions.
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