Abstract
ABSTRACTCobalt silicide formed by diffusion of Co through a Ti compound has been reported for both bilayer and multilayer Co/Ti-Si structurest[2-4]. To compare the bilayer and multilayer systems in terms of the Co silicide interfacial morphology, both bilayers and six layers of 20nm Co and lOnm Ti were sputter deposited on (100)Si in a system where background. oxygen and carbon were gettered by each Ti layer. The samples were annealed from 550°C to 800°C for 60 sec by lamp RTA in N2 ambient. XTEM micrographs revealed that significant differences in interfacial morphology existed between bilayer and multilayer samples. The interfacial amorphous Ti(O.C) diffusion barrier layer was found to be more effective in the multilayer system producing uniform CoSix layers as thin as ∼5nm after 550°C RTA, whereas the silicide formed in the bilaver samples under the same condition was rough. RBS analysis showed that the transformation temperature from CoSi to CoSi2 was 800°C in bilayers and even higher for multilayers. The higher transformation temperature is attributed to the additional Co available in the multilayer system and its effect on Co monosilicide phase stability as previously reported[10].
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