Abstract

The role of a thin layer of conductive poly(3,4-ethylenedioxythiophene) doped with polystyrene sulfonate (PEDOT : PSS), inserted between the gate dielectric and the active layer in poly(3-hexylthiophene)-based transistors was investigated. The devices were fabricated in the bottom-gate top-contact geometry by using cross-linked poly(vinyl alcohol) as the dielectric, whereas the PEDOT : PSS layer was prepared by using an aged aqueous dispersion with addition of different amounts of dimethyl sulfoxide (DMSO) as a secondary dopant. Under these conditions, both a significant reduction in the number of electrically active traps at the interface with the semiconductor and an improvement in the field-effect mobility were obtained, whereas the low power consumption was preserved. The threshold voltage was also displaced by approximately −1 V.

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