Abstract
The growth of Si on thin (∼3 nm thick) CaF2/Si(111) films in the temperature range of 500–700 °C was investigated using ultrahigh-vacuum noncontact atomic force microscopy. At 500 °C, the morphology is dominated by small cluster-like shaped Si islands due to weak binding between Si and CaF2; with increasing growth temperatures these islands coexist with an increasing amount of triangular-shaped, flat Si islands. The formation of flattened triangular islands is attributed to an increased binding of Si to the CaF2 film at higher temperatures. The binding changes as a result of an interface reaction leading to the removal of fluorine atoms and the formation of Ca–Si bonds.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.