Abstract
The conductance method has been used to measure the density of interface states of the ZnS/Hg0.775Cd0.225Te metal-insulator-semiconductor (MIS) system with three different HgCdTe surface treatments. It is found that the density of fast interface states increases from ∼1011 eV−1 cm−2 at the conduction-band minimum to ∼1013 eV−1 cm−2 near the valence-band maximum. In addition, the interface states located in the lower part of the band gap communicate with the valence band so efficiently that the effective band gap is reduced. Our observations explain why the p-type MIS photodiode is superior to the n-type version in terms of breakdown voltage and storage time.
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