Abstract
A short overview of atomic layer deposition (ALD) application in the interface engineering of photoelectrochemical (PEC) cells is given. The results of ALD technology-based interface and surface engineering for high-performance PEC cells in recent years are summarized and the challenges and opportunities of the development of ALD-based interface engineering for high-performance PEC cells in the near future are discussed. More details can be found in article number 2000819 by Zhuo Kang, Yue Zhang, and co-workers.
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