Abstract
The interaction of water with NiAl(110) has been investigated with temperature programmed desorption (TPD), X-ray photoelectron spectroscopy (XPS), and high resolution electron energy loss spectroscopy (EELS). Exposure of NiAl(110) to H 2O at 123 K results in primarily adsorbed H 2O, but the spectroscopic data suggests that OH (ad) may also be present. TPD shows that at low exposures, water desorbs from NiAl(110) at ∼ 190 K, and hydrogen desorbs between 300 and 400 K. The low temperature of H 2O desorption suggests that a weakly bound molecular state exists on NiAl(110). The majority of the chemisorbed H 2O, however, is more strongly bound, and dissociates to form an OH (ad) overlayer upon heating to 173 K. Our results suggest that while the adsorbed water is sensitive to the hybridized electronic structure of NiAl, the more strongly bound OH (ad) (and O (ad)) species appear to adopt a more atomic-like bonding to the Al component. The OH (ad) overlayer shows some dissociation by 250 K, and by 500 K the entire overlayer has decomposed, forming an Al 2O 3 layer.
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