Abstract
1. The chemisorption of O2 on Ni, applied on SiO2, is accompanied both by the oxidation of Ni and by the formation probably of a molecular form of chemisorbed O2. 2. The adsorption of H2 on a surface of Ni entirely covered with oxygen leads to the formation of H2O first according to the Rydil mechanism, and when adsorbed H atoms appear on the freed surface of Ni, according to the Langmuir-Hinshelwood mechanism. 3. The water formed in the first stages of the interaction of H2 with chemisorbed O2 diffuses from the surface of Ni and is chemisorbed on the surface of SiO2. The molecules of H2O formed in subsequent events of interaction are also adsorbed on the surface of SiO2 but are readily desorbed from it at room temperature.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callMore From: Bulletin of the Academy of Sciences of the USSR Division of Chemical Science
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
