Abstract
The adsorption and decomposition of formamide (NH/sub 2/CHO) on the hexagonally close-packed Ru(001) surface have been studied by using high-resolution electron energy loss spectroscopy and thermal desorption mass spectrometry. At 80 K, the initial adsorption of formamide results in CH bond cleavage and the formation of an eta/sup 2/(C,O)-NH/sub 2/CO species. This species decomposes upon annealing to 250 K, leaving a mixture of CO, NH/sub 3/, NH, and hydrogen adatoms on the surface. The NH/sub 3/ and CO desorb near 315 and 480 K, respectively, whereas the NH decomposes below 400 K to nitrogen and hydrogen adatoms. Recombinative desorption of H/sub 2/ occurs at 420 K, while recombinative desorption of N/sub 2/ occurs near 770 K. For higher initial formamide coverages (where the fractional coverage of formamide that decomposes exceeds approximately 0.05 monolayer), molecular adsorption in an eta/sup 1/(O)-NH/sub 2/CHO configuration is observed also at 80 K. This species undergoes competing desorption and decomposition at 225 K to an intermediate believed to be N-bonded NHCHO, which in turn converts to a species tentatively identified as eta/sup 1/(N)-NCHO at 300 K. The latter species decomposes to chemisorbed CO, N, and H near 375 K. Following a saturation formamide exposure on Ru(001)more » at 80 K, approximately 0.15 monolayer of formamide decomposes upon subsequent annealing, with approximately two-thirds of the total decomposing via the eta/sup 2/(C,O)-NH/sub 2/CO intermediate and the remainder reacting via the eta/sup 1/(O)-NH/sub 2/CHO.« less
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