Intel 22nm FinFET (22FFL) Process Technology for RF and mm Wave Applications and Circuit Design Optimization for FinFET Technology

H.-J Lee,V Neeli,Y Zhang,S Rami,S Ravikumar,K Phoa,B Sell

doi:10.1109/iedm.2018.8614490

Intel 22nm FinFET (22FFL) Process Technology for RF and mm Wave Applications and Circuit Design Optimization for FinFET Technology

H.-J Lee, V Neeli + Show 5 more

https://doi.org/10.1109/iedm.2018.8614490

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Publication Date: Dec 1, 2018

Citations: 64

Affiliation: Intel (United States)

#FinFET Process Technology #FinFET Process + Show 8 more

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Abstract

Intel 22FFL is a unique FinFET process technology optimized for RF and mmWave applications supporting superior RF performance to planar technologies with both f <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">t</sub> and f <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">max</sub> of NMOS above 300 GHz and 450 GHz respectively. Flicker noise improvement over planar technologies and excellent gain-power efficiency enabling low-power wireless applications are demonstrated.

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