Abstract
In this work, optimization of metalorganic chemical vapor deposition process for uniform layer thickness with especial attention to reactor geometric parameters as decision variables is presented. A numerical solution to a steady thermal flow associated with multi-species and chemical reactions in atmospheric pressure axisymmetrical rotating disk reactor by the CFD technique is obtained. Such a simulation is conducted on the assumption that the low Mach number flow is laminar. Then the validation of the numerical results with the benchmark solutions is conducted. Finally, integrating the CFD simulator with an optimization program, based on the Nelder–Mead algorithm, as a new approach is carried out to obtain the optimum value of decision variables. The obtained optimum configuration, results in a decrease in thickness deviation of deposited film from 29.8% to 16.5%.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callMore From: International Communications in Heat and Mass Transfer
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
