Abstract
AbstractDesign, fabrication and performance of a microspectrometer for operation in the infrared spectral range between 1 and 8 μm and fabricated in silicon are presented. The opto-electrical system is composed of two bonded silicon wafers, which have been subjected to microelectronic process compatible micromachining to enable co-integration of the optical components (an aluminum based grating, an optical path in crystalline silicon and an array of integrated polysilicon thermocouples) with readout circuits in silicon. The FWHM is smaller than 0.5 μm at λ= 5 μm. The performance is compared to alternatives and directions for improving the selectivity are given.
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