Abstract
We report integrated nonlinear plasmonic components integrated on a silicon photonics platform at telecommunications wavelengths. While metals commonly introduce loss, here less than 1dB insertion loss is possible by rapid nano-focussing and defocussing. Metallic components are designed to focus light to a 10 nm scale where nonlinear processes are greatly enhanced. We discuss progress on four-wave mixing over micron-scale interaction lengths as well as new results on Raman scattering. The technique introduces the possibility of compact, broadband, and efficient nonlinear silicon photonic devices.
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