Integrated Deep Ultraviolet Doublet Metalens for Projection Imaging

Abstract

Metalenses, with their unique modulation of light, are in great demand for many potential applications. As a proof-of-principle demonstration, we focus on designing SiO2 metalenses that operate in the deep ultraviolet region, specifically around 193 nm. Based on the deep ultraviolet metalens proposed in this paper, an integrated deep ultraviolet doublet metalens is further offered. When the incident light is a plane wave with a wavelength of 193 nm, the integrated doublet metalens can reduce the beam size by a factor of 4:1, and the emitted light is flat. The integrated doublet metalens can project the reticle image proportionally, making the projection image clear. The integrated doublet metalens has the best imaging effect at the propagation distance of 2 μm and can tolerate ±3 degrees of incident angle deviation. Our findings establish general and systematic strategies to guide the design of traditional optical lens arrays with excellent integrated doublet metalenses and pave the way for enhanced optical performance in the application of large-relative-aperture deep ultraviolet detection, deep ultraviolet microscope systems, laser beam combining systems, deep ultraviolet lithography systems, etc.