Abstract
During 1991 the Oxford Instruments’ compact synchrotron x-ray source Helios was installed at IBM’s Advanced Lithography Facility, following factory tests in Oxford during 1990. The machine has met or exceeded all performance specifications at the East Fishkill site. Since January, 1992 it has been run routinely for lithography development work. Running and reliability statistics are being generated, and the results for the first five months are presented here.
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Schedule a callMore From: Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
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