Abstract
Here we present the effects of Methyl Red (MR) doping on the electrical properties of the MoS2 field effect transistor (FET) in in-situ experimental system where the doping and electrical measurement are carried out in a single ultra-high vacuum chamber. A single-layered MoS2 flake was used as channel material for the FET preparation. N-type doping by MR was confirmed by the left shift of threshold voltage (Vth) and the surface vibrational change measured by Raman spectroscopy. The n-doping by MR is implied by the Fermi level shift towards greater binding energy with MR coverage, as proven by an X-ray photoelectron spectroscopy (XPS) measurement. It is estimated from XPS that the MoS2-FET device may detect the doping effect from the sub-monolayer MR. MR was detected on the MoS2 surface by the Time-of-Flight Secondary Ionization Mass Spectroscopy (ToF-SIMS). The findings may pave the way for innovations in electronic device design, with potential implications for fields ranging from nanoelectronics to sensor technology.
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