Abstract
Uniaxial anisotropy field, H/sub k/, and local anisotropy fluctuation were studied as a function of argon pressure during deposition for RF sputtered amorphous CoFeNb films. Influence of P/sub Ar/ on anistropy field H/sub k/, local anisotropy constant K/sub loc/, and S (structure constant) is discussed. The magnitude of S and K/sub loc/V/sup 1/2/ were found to be strongly dependent on P/sub Ar/. >
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