Abstract
Dispersion stability is a critical issue for the application of micron lanthanum-cerium-based slurry in liquid crystal display and other fields. Sodium hexametaphosphate (SHMP) is a commonly used dispersant, but there are problems that the dispersion mechanisms are not very detailed and the statements are inconsistent which are reported in the previous literature. In this work, the influence of SHMP on the dispersion of micron lanthanum-cerium-based abrasives was studied by Zeta potential, laser granularity analyzer, ICP, XRD, FT-IR, GPC, and other test methods. The experimental results showed that the lanthanum-cerium-based slurry containing 250 ppm SHMP could maintain suspension and dispersion stability in a wide pH range (pH 5–12). The adsorption capacity of SHMP on the surface of abrasives decreased, the steric hindrance of SHMP on slurry decreased, and the electrostatic repulsion increased with the increase of slurry pH. These findings suggest that the dispersion mechanism of SHMP may be the combination of steric hindrance and electrostatic repulsion when the pH of the slurry is smaller than the isoelectric point. At higher pH values, electrostatic repulsion was dominant.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callMore From: Colloids and Surfaces A: Physicochemical and Engineering Aspects
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
