Abstract
There are developed techniques for the preparation of diode lasers in the 1.3 to 1.8 μm range on the basis of quaternary epitaxial heterostructure. Devices for a particular wavelength of 1.3 μm are now commercially available. The state of art in the laser studies with connection to lower room-temperature threshold and to higher operation temperature is illustrated in fig. 9. We feel that the laser system of InGaAsP, which is known since 1974 [1, 2], may be elaborated further for higher laser characteristics in spite of the fact that present state is quite acceptable for different applications. There are many fibre-optics projects based on the conception of laser optical communication with the use of diodes in the range of 1.3–1.8 μm.
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