Initial strategy for design and fabrication of microgap electrodes

Abstract

With the emergence of nanotechnology, the desire for more shrinkage of electronic devices is gaining a wide spread acceptance. A compact nano laboratory on single chip is one of the devices employed under this scenario, thus, for the transition of microgap electrode to be successful there is a need for the pattern to be precisely transferred to sample wafers during fabrication. The article demonstrates the initial strategy for fabrication of microgap electrodes using conventional photolithography technique coupled with wet etching process. The study demonstrates the excellent strategy for fabrication of microgap electrodes by using polysilicon sample wafer and positive photoresist.